바로가기 메뉴
본문 바로가기
푸터 바로가기
TOP

“Electron energy-loss spectroscopy analysis of HfO2 dielectric films on strained and relaxed SiGe/Si substrates”

“Electron energy-loss spectroscopy analysis of HfO2 dielectric films on strained and relaxed SiGe/Si substrates”

저자

Jiyoung Jang, Tae Joo Park, Ji-Hwan Kwon, Jae Hyuck Jang, Cheol Seong Hwang and Miyoung Kim

저널 정보

출간연도

Applied Physics Letters, 92, 232906 (2008)