“Investigation of oxygen-related defects and the electrical properties of atomic layer deposited HfO(2) films using electron energy-loss spectroscopy”
Home“Investigation of oxygen-related defects and the electrical properties of atomic layer deposited HfO(2) films using electron energy-loss spectroscopy”
Home“Investigation of oxygen-related defects and the electrical properties of atomic layer deposited HfO(2) films using electron energy-loss spectroscopy”
“Investigation of oxygen-related defects and the electrical properties of atomic layer deposited HfO(2) films using electron energy-loss spectroscopy”
저자
Jae Hyuck Jang, Hyung-Suk Jung, Jeong Hwan Kim, Sang Young Lee, Cheol Seong Hwang and Miyoung Kim
