“Reduction of Electrical Defects in Atomic Layer Deposited HfO2 Films by Al Doping”
Home“Reduction of Electrical Defects in Atomic Layer Deposited HfO2 Films by Al Doping”
Home“Reduction of Electrical Defects in Atomic Layer Deposited HfO2 Films by Al Doping”
“Reduction of Electrical Defects in Atomic Layer Deposited HfO2 Films by Al Doping”
저자
Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Choong-Ki Lee, Kwang Duk Na, Sang Young Lee, Hyung-Suk Jung, Miyoung Kim, Seungwu Han and Cheol Seong Hwang
