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“Role of Carbon on Resistivity and Structure of HfCxNy Films Grown by Low Temperature MOCVD”

“Role of Carbon on Resistivity and Structure of HfCxNy Films Grown by Low Temperature MOCVD”

저자

Jae Hyuck Jang, Tae Joo Park, Jeong Hwan Kim, Kwang Duk Na, Woo Young Park, Miyoung Kim and Cheol Seong Hwang

저널 정보

출간연도

Journal of The Electrochemical Society, 156(1) H76-H79 (2009)