Home “Role of Carbon on Resistivity and Structure of HfCxNy Films Grown by Low Temperature MOCVD”
저자
Jae Hyuck Jang, Tae Joo Park, Jeong Hwan Kim, Kwang Duk Na, Woo Young Park, Miyoung Kim and Cheol Seong Hwang
저널 정보
출간연도
Journal of The Electrochemical Society, 156(1) H76-H79 (2009)
링크
https://iopscience.iop.org/article/10.1149/1.3021038/meta